Fabrication of hp 32 nm resist patterns using...

Microelectronic Engineering 2007 Vol. 84; Iss. 5-8

Fabrication of hp 32 nm resist patterns using near-field lithography

Takako Yamaguchi, Tomohiro Yamada, Akira Terao, Toshiki Ito, Yasuhisa Inao, Natsuhiko Mizutani, Ryo Kuroda
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Volume:
84
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2007.01.115
File:
PDF, 655 KB
english, 2007
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