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Improving the sensitivity and line edge roughness in inorganic positive electron beam resist
Kenta Ogino, Jun Taniguchi, Shin-ichi Satake, Keisuke Yamamoto, Yoshiaki Ishii, Kiyoshi IshikawaVolume:
84
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2007.01.144
File:
PDF, 885 KB
english, 2007