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SrHfO3 as gate dielectric for future CMOS technology
C. Rossel, M. Sousa, C. Marchiori, J. Fompeyrine, D. Webb, D. Caimi, B. Mereu, A. Ispas, J.P. Locquet, H. Siegwart, R. Germann, A. Tapponnier, K. BabichVolume:
84
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2007.04.029
File:
PDF, 1.30 MB
english, 2007