Understanding of the thermal stability of the hafnium...

Microelectronic Engineering 2007 Vol. 84; Iss. 9-10

Understanding of the thermal stability of the hafnium oxide/TiN stack via 2 “high k” and 2 metal deposition techniques

V. Cosnier, P. Besson, V. Loup, L. Vandroux, S. Minoret, M. Cassé, X. Garros, J-M. Pedini, S. Lhostis, K. Dabertrand, C. Morin, C. Wiemer, M. Perego, M. Fanciulli
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Volume:
84
Year:
2007
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2007.04.041
File:
PDF, 582 KB
english, 2007
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