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Roughness improvement of the CoSi2/Si-interface for an application as buried silicide
S. Zimmermann, Q.T. Zhao, H. Höhnemann, M. Wiemer, C. Kaufmann, S. Mantl, V. Dudek, T. GessnerVolume:
84
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2007.05.056
File:
PDF, 707 KB
english, 2007