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Development and validation of functional imprint material for the step and flash imprint lithography process
J. Kettle, P. Coppo, G. Lalev, C. Tattershall, S. Dimov, M.L. TurnerVolume:
85
Year:
2008
Language:
english
Pages:
3
DOI:
10.1016/j.mee.2007.12.070
File:
PDF, 515 KB
english, 2008