Stamp deformation and its influence on residual layer homogeneity in thermal nanoimprint lithography
S. Merino, A. Retolaza, H. Schift, V. TrabadeloVolume:
85
Year:
2008
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2008.01.045
File:
PDF, 750 KB
english, 2008