Fabrication of nanoimprint template in Si with high etch rate by non-switch DRIE process
Xudi Wang, Yifang Chen, Ling Wang, Zheng CuiVolume:
85
Year:
2008
Language:
english
Pages:
3
DOI:
10.1016/j.mee.2008.01.073
File:
PDF, 231 KB
english, 2008