A simulation model for chemically amplified resist CAMP6

A simulation model for chemically amplified resist CAMP6

Katia Vutova, Elena Koleva, Georgy Mladenov, Ivan Kostic, Takeshi Tanaka, Keishi Kawabata
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Volume:
86
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2008.11.010
File:
PDF, 405 KB
english, 2009
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