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Sub-10 nm silicon ridge nanofabrication by advanced edge lithography for NIL applications
Yiping Zhao, Erwin Berenschot, Henri Jansen, Niels Tas, Jurriaan Huskens, Miko ElwenspoekVolume:
86
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2008.11.067
File:
PDF, 330 KB
english, 2009