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Process control for 32 nm imprint masks using variable shape beam pattern generators
Ecron Thompson, Kosta Selinidis, John G. Maltabes, Douglas J. Resnick, S.V. SreenivasanVolume:
86
Year:
2009
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2008.11.071
File:
PDF, 743 KB
english, 2009