Electron beam induced deposited etch masks
C.Th.H. Heerkens, M.J. Kamerbeek, W.F. van Dorp, C.W. Hagen, J. HoekstraVolume:
86
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2008.11.079
File:
PDF, 519 KB
english, 2009