Improving etch selectivity and stability of novolak based...

Microelectronic Engineering 2009 Vol. 86; Iss. 4-6

Improving etch selectivity and stability of novolak based negative resists by fluorine plasma treatment

M.M. Blideran, M. Häffner, B.-E. Schuster, C. Raisch, H. Weigand, M. Fleischer, H. Peisert, T. Chassé, D.P. Kern
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Volume:
86
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2008.12.057
File:
PDF, 420 KB
english, 2009
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