Analysis of nitride storage non-volatile memories with HfSiOx blocking dielectric and TiN metal gate for low power embedded applications
Dušan S. Golubović, Michiel J. van Duuren, Nader Akil, Antonio Arreghini, Francesco DriussiVolume:
86
Year:
2009
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2009.01.028
File:
PDF, 851 KB
english, 2009