Atomic layer deposition of high capacitance density...

Atomic layer deposition of high capacitance density Ta2O5–ZrO2 based dielectrics for metal–insulator–metal structures

Indrek Jõgi, Kaupo Kukli, Mikko Ritala, Markku Leskelä, Jaan Aarik, Aleks Aidla, Jun Lu
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Volume:
87
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2009.06.032
File:
PDF, 551 KB
english, 2010
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