Atomic layer deposition of high capacitance density Ta2O5–ZrO2 based dielectrics for metal–insulator–metal structures
Indrek Jõgi, Kaupo Kukli, Mikko Ritala, Markku Leskelä, Jaan Aarik, Aleks Aidla, Jun LuVolume:
87
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2009.06.032
File:
PDF, 551 KB
english, 2010