Contact and proximity lithography using 193 nm Excimer laser in Mask Aligner
S. Partel, S. Zoppel, P. Hudek, A. Bich, U. Vogler, M. Hornung, R. VoelkelVolume:
87
Year:
2010
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2009.11.171
File:
PDF, 592 KB
english, 2010