Effects of Ar and O2 additives on photopatternable sol–gel...

Microelectronic Engineering 2010 Vol. 87; Iss. 11

Effects of Ar and O2 additives on photopatternable sol–gel etching in an SF6-based plasma for planar lightwave circuit fabrication

B. Kolodziejczyk, A.R. Ellingboe, S. Daniels, L. Oksuz, M. Oubaha, H. Barry, R. Copperwhite, K. O’Dwyer, B.D. MacCraith
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Volume:
87
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2009.12.084
File:
PDF, 571 KB
english, 2010
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