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Effect of fluorinated silicate glass passivation layer on electrical characteristics and dielectric reliabilities for the HfO2/SiON gate stacked nMOSFET
Chih-Ren Hsieh, Yung-Yu Chen, Jen-Chung LouVolume:
87
Year:
2010
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2010.02.010
File:
PDF, 1.16 MB
english, 2010