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New generation of Self Ionized Plasma copper seed for sub 40 nm nodes
J. Guillan, K. Haxaire, S. Chhun, E. Richard, M.C. Luche, L. Arnaud, E. Petitprez, C. Monget, D. Galpin, P. NormandonVolume:
88
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2010.07.035
File:
PDF, 540 KB
english, 2011