Influence of dummy active patterns on mechanical stress...

Microelectronic Engineering 2011 Vol. 88; Iss. 6

Influence of dummy active patterns on mechanical stress induced by spin-on-glass-filled shallow trench isolation in n-MOSFETs

Dongwoo Kim, Seonhaeng Lee, T.K. Oh, S.Y. Cha, S.J. Hong, Bongkoo Kang
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Volume:
88
Year:
2011
Language:
english
Pages:
6
DOI:
10.1016/j.mee.2010.11.036
File:
PDF, 281 KB
english, 2011
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