Robust PECVD SiC membrane made for stencil lithography

Microelectronic Engineering 2011 Vol. 88; Iss. 8

Robust PECVD SiC membrane made for stencil lithography

Shenqi Xie, Veronica Savu, Wei Tang, Oscar Vazquez-Mena, Katrin Sidler, Haixia Zhang, Jürgen Brugger
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Volume:
88
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2010.11.056
File:
PDF, 891 KB
english, 2011
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