Nanoimprint lithography from CHARPAN Tool exposed master...

Microelectronic Engineering 2011 Vol. 88; Iss. 8

Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5 nm hp

M. Muehlberger, M. Boehm, I. Bergmair, M. Chouiki, R. Schoeftner, G. Kreindl, M. Kast, D. Treiblmayr, T. Glinsner, R. Miller, E. Platzgummer, H. Loeschner, P. Joechl, S. Eder-Kapl, T. Narzt, E. Lausec
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Volume:
88
Year:
2011
Language:
english
Pages:
4
DOI:
10.1016/j.mee.2010.12.110
File:
PDF, 1.18 MB
english, 2011
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