Low temperature direct imprint of polyhedral oligomeric...

Microelectronic Engineering 2011 Vol. 88; Iss. 8

Low temperature direct imprint of polyhedral oligomeric silsesquioxane (POSS) resist

Nikolaos Kehagias, Marc Zelsmann, Mustapha Chouiki, Achille Francone, Vincent Reboud, Rainer Schoeftner, Clivia Sotomayor Torres
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Volume:
88
Year:
2011
Language:
english
Pages:
3
DOI:
10.1016/j.mee.2011.02.047
File:
PDF, 486 KB
english, 2011
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