ICP-RIE etching of self-aligned InP based HBTs with Cl2/N2 chemistry
S. Topaloglu, W. Prost, F.-J. TegudeVolume:
88
Year:
2011
Language:
english
Pages:
5
DOI:
10.1016/j.mee.2011.02.056
File:
PDF, 739 KB
english, 2011