Modeling growth rate of HfO2 thin films grown by...

Modeling growth rate of HfO2 thin films grown by metal–organic molecular beam epitaxy

Myoung-Seok Kim, Young-Don Ko, Tae-Houng Moon, Jae-Min Myoung, Ilgu Yun
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Volume:
37
Year:
2006
Language:
english
Pages:
9
DOI:
10.1016/j.mejo.2005.04.055
File:
PDF, 665 KB
english, 2006
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