Experimental analysis and optimization of a photo resist...

Experimental analysis and optimization of a photo resist coating process for photolithography in wafer fabrication

Yung-Kuang Yang, Tsun-Ching Chang
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Volume:
37
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.mejo.2005.10.006
File:
PDF, 148 KB
english, 2006
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