Molecular dynamic simulation of damage formation at Si vertical walls by grazing incidence of energetic ions in gate etching processes
Mizotani, Kohei, Isobe, Michiro, Hamaguchi, SatoshiVolume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4907724
Date:
March, 2015
File:
PDF, 2.21 MB
english, 2015