Study of Sputtering Mechanism of Silicon with Hydrogen...

Japanese Journal of Applied Physics 1994 / 3 Vol. 33; Iss. Part 2, No

Study of Sputtering Mechanism of Silicon with Hydrogen Plasma Controlled by Magnetic Field

Sun, Yong, Nishitani, Ryusuke, Miyasato, Tatsuro
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L263
Date:
March, 1994
File:
PDF, 651 KB
1994
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