Study of performance scaling of 22-nm epitaxial delta-doped channel MOS transistor
Sengupta, Sarmista, Pandit, SoumyaVolume:
102
Language:
english
Journal:
International Journal of Electronics
DOI:
10.1080/00207217.2014.945194
Date:
June, 2015
File:
PDF, 770 KB
english, 2015