Characterization of Thin Films Deposited with Precursor...

Plasma Science and Technology 2007 / 08 Vol. 9; Iss. 4

Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition

Kailun, Yao, Jianwan, Zheng, Zuli, Liu, Lihui, Jia
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Volume:
9
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/9/4/11
Date:
August, 2007
File:
PDF, 332 KB
english, 2007
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