Physical Properties of Highly Conformal TiN Thin films...

Japanese Journal of Applied Physics 2003 / 3 Vol. 42; Iss. Part 1, No

Physical Properties of Highly Conformal TiN Thin films Grown by Atomic Layer Deposition

Kim, Jaebum, Hong, Hyunseok, Ghosh, Subhankar, Oh, Ki-Young, Lee, Chongmu
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Volume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.1375
Date:
March, 2003
File:
PDF, 286 KB
english, 2003
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