Electrical Properties of TaOx Thin Films for ReRAM Prepared...

Electrical Properties of TaOx Thin Films for ReRAM Prepared by Reactive RF Magnetron Sputtering Method

Fukuda, Natsuki, Kurihara, Hidenao, Horita, Kazumasa, Yoshida, Yoshiaki, Kokaze, Yutaka, Nishioka, Yutaka, Suu, Koukou
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Volume:
1250
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-1250-g12-12
Date:
January, 2010
File:
PDF, 205 KB
english, 2010
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