Performances of hafnium oxide produced by radio frequency sputtering for gate dielectric application
L Pereira, A Marques, H Águas, N Nedev, S Georgiev, E Fortunato, R MartinsVolume:
109
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.mseb.2003.10.053
File:
PDF, 150 KB
english, 2004