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Roughness, impurities and strain in low-temperature epitaxial silicon films grown by tantalum filament hot-wire chemical vapor deposition
Teplin, Charles W., Page, Matthew, Iwaniczko, Eugene, Jones, Kim M., Ready, Robert M., To, Bobby M., Moutinho, Helio M., Wang, Qi M., Branz, Howard M.Volume:
910
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-0910-a15-01
Date:
January, 2006
File:
PDF, 1.36 MB
english, 2006