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Epitaxial growth of copper silicides by “bilayer” technique on monocrystalline silicon with and without native SiOx
N. Benouattas, L. Osmani, L. Salik, C. Benazzouz, M. Benkerri, A. Bouabellou, R. HalimiVolume:
132
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.mseb.2006.04.032
File:
PDF, 232 KB
english, 2006