Determination of the sputter rate variation pattern of a silicon carbide target for radio frequency magnetron sputtering using optical transmission measurements
G. Gálvez de la Puente, J.A. Guerra Torres, O. Erlenbach, M. Steidl, R. Weingärtner, F. De Zela, A. WinnackerVolume:
174
Year:
2010
Language:
english
Pages:
5
DOI:
10.1016/j.mseb.2010.03.012
File:
PDF, 415 KB
english, 2010