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Silicate formation at the interface of Pr-oxide as a high-K dielectric and Si(001) surfaces
D. Schmeißer, F. Zheng, V. Perez-Dieste, F.J. Himpsel, R. LoNigro, R.G. Toro, G. Malandrino, I.L. FragalàVolume:
26
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.msec.2005.09.104
File:
PDF, 151 KB
english, 2006