An Electrical, Compositional, and Structural Study on Low-k Silsesquioxane Dielectric Thin Films
Ligatchev, V., Goh, T. K., Yu, S., Rusli,Volume:
152
Year:
2005
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1921787
File:
PDF, 155 KB
english, 2005