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[IEEE 11th International Conference on Ion Implantation Technology - Austin, TX, USA (16-21 June 1996)] Proceedings of 11th International Conference on Ion Implantation Technology - Range and damage distributions in ultra-low energy boron implantation into silicon

Hatzopoulos, N., Suder, S., van den Berg, J.A., Donnelly, S.E., Cook, C.E.A., Armour, D.G., Panknin, D., Fukarek, W., Lucassen, M., Frey, L., Foad, M.A., England, J.G., Moffatt, S., Bailey, P., Noakes
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Year:
1997
Language:
english
DOI:
10.1109/iit.1996.586431
File:
PDF, 459 KB
english, 1997
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