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Structural and Concentration Heterogeneities during Formation of Silicide Phases in the Thin Film System Ti(5nm)/Ni(24nm)/Si(001)
Sidorenko, S.I., Voloshko, S.M., Мakogon, Yu.M., Pavlov, O.P., Kotenko, I.E., Zamulko, S.O., Konorev, S.I.Volume:
344
Language:
english
Journal:
Defect and Diffusion Forum
DOI:
10.4028/www.scientific.net/DDF.344.79
Date:
October, 2013
File:
PDF, 477 KB
english, 2013