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Direct chemical vapor deposition growth of tunable HfSiON films by a new precursor combination
Xia, Bin, Fisher, Matthew L., Stemper, Harold, Misra, AshutoshVolume:
22
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.2007.0119
Date:
April, 2007
File:
PDF, 135 KB
english, 2007