Synchrotron radiation-excited etching of ZnTe using Ar gas

Synchrotron radiation-excited etching of ZnTe using Ar gas

Tooru Tanaka, Yusuke Kume, Kazuki Hayashida, Katsuhiko Saito, Mitsuhiro Nishio, Qixin Guo, Hiroshi Ogawa
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Volume:
238
Year:
2005
Language:
english
Pages:
4
DOI:
10.1016/j.nimb.2005.06.029
File:
PDF, 191 KB
english, 2005
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