Ion backscattering study of ultra-thin oxides: Al2O3 and...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2005 Vol. 241; Iss. 1-4

Ion backscattering study of ultra-thin oxides: Al2O3 and AlHfOx films on Si

Leszek S. Wielunski, Yves Chabal, Margareta Paunescu, M.-T. Ho, Rhett Brewer, Johan E. Reyes
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Volume:
241
Year:
2005
Language:
english
Pages:
5
DOI:
10.1016/j.nimb.2005.07.045
File:
PDF, 114 KB
english, 2005
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