Binary HfO2: SiO2 used as High-k Gate Oxide Material in...

MRS Proceedings 2005 / 1 Vol. 894

Binary HfO2: SiO2 used as High-k Gate Oxide Material in Combinatorial Material Library Method

Chao, Wen-Hsuan, Wang, Lih-Ping, Wang, Shu-Huei, Huang, Tien-Heng, Wu, Ren-Jen, Cheng, Hung-Chiao
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Volume:
894
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0894-LL03-30
Date:
January, 2005
File:
PDF, 168 KB
english, 2005
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