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Epitaxial CoSi2 formation using an oxynitride buffer layer
Lee, Jaesang, Lee, Keunwoo, Kim, Dongock, Park, Taeyong, Kim, Honggyu, Jeon, HyeongtagVolume:
24
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.2009.0320
Date:
August, 2009
File:
PDF, 1.06 MB
english, 2009