[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October 17, 2008)] ECS Transactions - Evaluation of MOCVD Grown Niobium Nitride Films as Gate Electrode for Advanced CMOS Technology
Thiede, Tobias, Parala, Harish, Reuter, Knud, Passing, Gerd, Kirchmeyer, Stephan, Hinz, Jörn, Lemberger, Martin, Bauer, Anton, Fischer, RolandVolume:
16
Year:
2008
Language:
english
DOI:
10.1149/1.2981605
File:
PDF, 337 KB
english, 2008