Effect of growth parameters on refractive index and film composition of plasma enhanced chemical vapor deposition silicon oxynitride films
Naskar, S., Bower, C. A., Yadon, L. N., Wolter, S.D., Stoner, B.R., Glass, J.T.Volume:
848
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-848-FF3.22
Date:
January, 2004
File:
PDF, 93 KB
english, 2004