Effect of Slurry Application∕Injection Schemes on Slurry Availability during Chemical Mechanical Planarization (CMP)
Liao, Xiaoyan, Sampurno, Yasa, Zhuang, Yun, Philipossian, AraVolume:
15
Year:
2012
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/2.009205esl
File:
PDF, 192 KB
english, 2012