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Studies of electron energy loss near edge structure at the interface between Si and amorphous carbon films deposited by direct carbon ion beams
Sohn, M. H., Kim, S. I., Siangchaew, K.Volume:
14
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/JMR.1999.0435
Date:
August, 1999
File:
PDF, 151 KB
english, 1999