On determination of properties of ultrathin and very thin silicon oxide layers by FTIR and X - ray reflectivity
Kopani, Martin, Jergel, Matej, Kobayashi, Hikaru, Takahashi, Masao, Brunner, Robert, Mikula, Milan, Imamura, Kentarou, Jurecka, Stanislav, Pincik, EmilVolume:
1066
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1066-A07-03
Date:
January, 2008
File:
PDF, 83 KB
english, 2008